Speaker
Description
The ultra-compact X-ray FEL (UC-XFEL) is an extremely attractive path for creating intense, coherent, short-wavelength light pulses. This scheme uniquely utilizesThe very high gradient cryo-RF for generating very high brightness electron beams, and accelerating thdm in short distances to GeV-class energy - both enabled by peak fields near 250 MV/m. This approach further permits use of very short-period undulators, permitting a 1 nm high performance FEL driven with a 1 GeV beam. While the original pro proposal was aimed at soft-X-ray science, recently this collaboration has pivoted to development of a hard X-ray (above 9 keV) version of the UC-XFEL that is aimed at transforming inspection techniques for next-generaty chips via ptychographic laminography - 3D imaging with few nm resolution. This development has been funded by the US DOE to study the commercial design, leading to the founding in 2025 of a new company. Ptyko, Inc., aimed at rapid commercialization of this technology. We describe this instrument and its revolutionary approach to imaging. As a stepping stone the hard X-ray machine, we plan to develop a 13.5 nm compact FEL for actinic inspection and review of lithography masks, utilizing ptychography to gain a dramatic advantages in image quality and processing.
| Working group | WG6 |
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