2021 CAP Virtual Congress / Congrès virtuel de l'ACP 2021

POS-B7 -- Optical Emission Interferometry for Monitoring of Plasma Processes

9 Jun 2021, 13:49

2m

Underline Conference System

Poster (Non-Student) / Affiche (Non-étudiant(e)) Symposia Day (DPP) - Low temperature plasmas/Fusion plasmas (magnetic and inertial confinement)/ Laser plasmas/Basic plasmas W-POS-B #5-8 Poster session (DPP) / Session d'affiches (DPP)

Speaker

Mr Yu Ying Chang (Plasmionique)

Description

We present our simple and cost-efficient setup for real-time monitoring of substrate thickness in plasma etching/deposition processes. Thin film interference occurs as light from the plasma passes through the substrate material, by observing the cycles of peaks and troughs in the intensity, the rate of etching/deposition was obtained.