Speaker
Michael Bradley
Description
Microwave Plasma Enhanced Chemical Vapour Deposition (PECVD) is a versatile technique for thin film deposition. Our group has been developing this technique for deposition of diamond thin films for a variety of applications including quantum applications of the diamond NV- centre, thermal transport layers for semiconductor layers, and nuclear battery applications.
The characterization of the microwave plasma is a key requirement for repeatable film deposition. This talk will report on new work in this area of plasma characterization which we have recently embarked upon.
| Keyword-1 | microwave |
|---|---|
| Keyword-2 | PECVD |
| Keyword-3 | thin films |
Author
Co-author
Ms
Portia Switzer
(University of Saskatchewan)