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We report the growth of molybdenum oxide nanostructures (NSs) by low-energy silver (Ag) ion irradiation. A ≈200 nm MoO3 film was deposited on Si substrates with native oxide layer by physical vapor deposition (PVD) technique. Then, 30 KeV Ag at the fluence of 5 × 10^14 , 5 × 10^15 and 2 × 10^16 ions/cm 2 was implanted on MoO3 film. From the FESEM images, it has been observed that, films transformed to rod like structures with increasing fluence from 5 × 10^14 to 2× 10^16 ions/cm^2 X-ray photoelectron spectroscopy (XPS) measurements reveal that with increasing Ag fluence, oxygen vacancy increases, MoO 3 concentration decreases, and more and more Si substrate is getting exposed. With increasing Ag fluence, RMS roughness increases from 53 nm to 261 nm, whereas band gap decreases from 3.5 eV to 2.6 eV and local work function decreases from 5.64±0.05 eV to 4.81±0.04 eV. Field emission turn-on field decreased from 5.77 V/μm for 10 μA/cm 2 to 4.83 V/μm for as deposited film to 2 × 10^16 ions/cm^2 Ag implanted sample.Highest fluence of Ag implanted sample shows better field emitter due to rod like structures, low work function, low band gap, low turn-on field and highest filed enhancement factor (FEF). In order to validate the experimental results, extensive TRI3DYN simulation was performed to show Ag enriched rod formation, atomic densities, defect densities and roughness after Ag ion irradiation.