Sep 20 – 25, 2026
University of Graz
Europe/Vienna timezone

Al(X)N-based thin films for advanced MEMS applications

Sep 21, 2026, 11:00 AM
15m
HS 05.12 (University of Graz)

HS 05.12

University of Graz

05 - Physics, 1st floor
3) Contributed talk M32 - Physical Vapor Deposition of Nitride Thin Films Mini-Colloquium

Speaker

Marco Deluca (Silicon Austria Labs GmbH)

Description

Al(X)N substituted with Sc (Al1-xScxN, ASN) is one of the most popular thin film materials for piezoelectric micro-electromechanical system (MEMS) devices. One of the main challenges is to tailor composition and microstructure of ASN to achieve piezoelectric properties suitable for actuator applications.

In this work, we will showcase some approaches to enhance the piezoelectric performance of ASN either by improving the crystal quality or by designing tailored multilayer thin film stacks. In particular, we will show that by employing carefully optimized sputtering processes and suitable buffer layers and electrode designs, Al0.64Sc0.36N multilayer thin films achieve excellent piezoelectric properties, making them a valid alternative to lead-based materials for piezoMEMS. Using a compositionally graded approach, we were also able to tailor the ferroelectric imprint of AlScN thin films, which is relevant to implementation as bimorph actuator or as ferroelectric memory. Furthermore, by employing a mixed experimental-computational approach, we are also exploring alternative AlN-based alloys (e.g. AlYN), which may lead to replacing the critical element Sc, thus enhancing the sustainability and EU strategic autonomy for this class of materials.

Author

Marco Deluca (Silicon Austria Labs GmbH)

Co-authors

Balasubramanian Sundarapandian (Silicon Austria Labs GmbH) Dmytro Solonenko (Silicon Austria Labs GmbH) Joaquín Miranda (Silicon Austria Labs GmbH) Sanjay Nayak (Silicon Austria Labs GmbH) Venkata Raveendra Nallagatla (Silicon Austria Labs GmbH) Tai Nguyen (Silicon Austria Labs GmbH) Nastaran Behravan (Silicon Austria Labs GmbH)

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