Speaker
Description
Focused Ion Beam Induced Deposition (FIBID) provides a versatile route for nanoscale fabrication, though the resulting material properties are highly sensitive to ion species and processing parameters. Our present study investigates the Xe⁺-ion-assisted deposition of W-C composites using a tungsten carbonyl precursor. The effects of beam energy and current on the composition, surface morphology, and microstructure were systematically characterized using SEM/EDX, AFM, and TEM.
For comparison, Ga⁺-induced deposits were fabricated under comparable conditions to isolate the influence of the ion species on precursor dissociation and impurity levels. Results demonstrate that Xe-FIBID produces denser nanocomposites with significantly reduced contamination compared to Ga⁺-based methods. These findings offer critical insights into ion-matter interactions and position Xe plasma FIB systems as superior tools for high-purity nanofabrication and device prototyping.