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The controlled fabrication of horizontal nanowires with multiple contact points to a substrate is significant for applications in nanoelectronics, circuit design, and advanced characterization techniques. Such geometries enable well-defined electrical interfacing and increased flexibility in device integration. However, their realization via additive nanofabrication remains challenging. In particular, focused electron beam induced deposition (FEBID), despite its versatility for direct-write 3D nanostructuring, intrinsically favours vertical growth due to localized precursor dissociation and electron–matter interactions [1,2]. In this work, we investigate the optimization of horizontal nanowire growth using FEBID in combination with the layer-by-layer 3D nanoprinting software f3ast. Key beam parameters, including electron beam current and acceleration voltage, are systematically varied together with the stage angle, while the dwell times and growth rate are defined within the f3ast patterning routine. The results demonstrate that controlled modulation of these parameters enables the fabrication of stable nanowires with controlled geometry, allowing for the formation of straight segments. Lower acceleration voltages combined with optimized beam currents are found to enhance lateral growth by promoting surface-confined energy deposition. These findings help establish practical guidelines for the reliable fabrication of simple and complex horizontal architectures which can be used in 3D spintronics.
[1] L. Skoric, et al. Layer-by-Layer Growth of Complex-Shaped Three-Dimensional Nanostructures with Focused Electron Beams, Nano Letters (2020) 20 (1), 184-191
[2] R. Winkler, et al. High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals, ACS Applied Nano Materials 2018 1 (3), 1014-1027