Speaker
Description
Molybdenum Carbide (Mo2C) has a variety of useful properties and thus a lot of possible applications. Mo2C has good catalytic properties similar to the platinum metal group i.e. H2 production, water gas shift reaction or ammonia synthesis. In literature different approaches are reported to deposit thin films of Mo2C on substrates. Most commonly used are CVD systems with H2/Ar/CH4 flow and MoCl6, MoF6 or ammonium heptamolybdate tetrahydrate as precursor which require complex instrumentation and strict safety precautions. Further thin film methods use PVD and electrodeposition. Another CVD method obtains larger two-dimensional (2D) Mo2C crystals using molybdenum and copper metal-foils, Mo2C growing on liquid copper in H2/Ar/CH4 flow. This method is more limited because it can not be applied on substrates and difficulties of Mo2C transfer. We here present a new adaptation to such approach, simplifying the instrumentation and moving towards transfer-less uniform Mo2C coverage on functional substrates. The resulting Mo2C films may then be used in many applications, incl., e.g., electrochemical sensing applications.