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Recent advances in nanofabrication enable three-dimensional (3D) nanoarchitectures for studying curvature-controlled superconductivity [1] which promise unconventional transport characteristics [2]. In this work, we investigate how curvature affects superconducting properties of thin-film NbN using a fabrication approach combining two-photon lithography (TPL) and Plasma-Enhanced Atomic Layer Deposition (PEALD). This additive manufacturing strategy, previously applied to curved ferromagnetic systems [3,4], is extended to superconductors to enable systematic experimental studies of 3D geometry-driven effects. Bow-shaped free-standing polymer structures were fabricated via TPL and coated with 30-nm-thick NbN by PEALD. Cross-sectional analysis using xenon plasma focused ion beam milling and scanning electron microscopy confirms conformal NbN deposition. The film indeed replicates template irregularities resulting from a non-optimized stepwise TPL exposure and further template modification attributed to the deposition process. A thermal treatment of the polymer at 450 °C [2] smoothened the TPL resist surface being preserved in the PEALD. Transport measurements were performed on NbN microbridges on planar Si substrates as well as stepped and curved templates. Planar NbN films exhibited superconductivity with a critical temperature (Tc) of almost 13 K. The growth over rough steps etched into a Si substrate reduced Tc locally to 7.5 K, highlighting sensitivity to morphology. 3D curved microbridges were several micrometres long and exhibited large surface corrugation due to non-optimized templates. Contacted in a four-probe configuration, their transport characteristics indicated the existence of segments which remained normal conducting down to 1.8 K. Measurements of smoothened 3D bridges are in progress. In conclusion, we present a scalable platform for both fabricating 3D NbN nanoarchitectures and exploring experimentally curvature-controlled superconductivity. Funding: Swiss National Science Foundation (Grant No. 10000845). Support by D. Bouvet, O. Huang, N. Roch and further staff members at CMi and CIME of EPFL is acknowledged. References: [1] V. M. Fomin and O. V. Dobrovolskiy, Appl. Phys. Lett. 120, 090501 (2022). [2] A. J. M. Deenen and D. Grundler, Nano Lett. DOI: 10.1021/acs.nanolett.5c06341. [3] H. Guo et al., Adv. Mater. 35, 2303292 (2023). [4] M. Xu et al., Nat. Nanotechnol. 20, 1258–1265 (2026).