31 August 2026 to 4 September 2026
Queen Mary University of London, London, UK
Europe/London timezone

Backside-Processed MAPS for Low-Energy Spectroscopy

Not scheduled
20m
Mile End Campus: Graduate Centre Foyer and Peston Lecture Theatre (Queen Mary University of London, London, UK)

Mile End Campus: Graduate Centre Foyer and Peston Lecture Theatre

Queen Mary University of London, London, UK

Poster Applications in Particle Physics

Speaker

Gaël Chevrier (IPHC CNRS)

Description

Monolithic Active Pixel Sensors (MAPS) have demonstrated excellent performance in the field of high-energy physics, especially with improved timing performance with respect to standard CMOS imaging sensor. Their application to low-energy spectroscopy seems promising, however, requires dedicated sensor optimization in order to minimize the inactive entrance layer and enhance charge collection efficiency. This work presents the characterization of a Monolithic Imager sensor developed in a modified TowerJazz 0.18 µm CMOS imaging process and optimized for low-energy particle and photon detection.

The back side of the sensor was post-processed with ion implantation and laser annealing by IBS [1]. This treatment enables the formation of an ultra-thin entrance window, significantly improving sensitivity to low-energy particles.

Sensor characterization was performed using a low-noise readout system to study the noise and energy resolution. Measurements with the 55Fe source show a clear separation between characteristic lines and demonstrate the suitability of the sensor for spectroscopic applications. Additional measurements results obtained with a tritium source prove that the sensor can detect very low-energy beta particles.

The results confirm the effectiveness of the backside processing approach and highlight the potential of MAPS technology for applications requiring direct detection of low-energy radiation, including environmental monitoring, radioprotection, and scientific instrumentation.

[1] Laser activation of Ultra Shallow Junctions (USJ) doped by Plasma Immersion Ion Implantation (PIII), Applied Surface Science 255 (2009) 5647–5650

Authors

Co-authors

Elio Sacchetti (Centre National de la Recherche Scientifique (FR)) Jerome Baudot (IPHC - Strasbourg)

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