21–26 Jun 2026
U. Ottawa - Learning Crossroads (CRX) Building
America/Toronto timezone
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Additive mechanosynthesis of carbon dimers through selective hydrogen depassivation of the Si(100) surface

Not scheduled
15m
U. Ottawa - Learning Crossroads (CRX) Building

U. Ottawa - Learning Crossroads (CRX) Building

100 Louis-Pasteur Private, Ottawa, ON K1N 9N3
Oral (Non-Student) / Orale (non-étudiant(e)) Condensed Matter and Materials Physics / Physique de la matière condensée et matériaux (DCMMP-DPMCM) (DCMMP) R1-4 | (DPMCM)

Speaker

Megan Cowie (CBN Nano Technologies Inc.)

Description

Atomically precise fabrication through the controlled reactivity and placement of chemical species was one of the goals defined within the earliest visions of nanotechnology. A first example of this, the controlled abstraction of a hydrogen atom from a passivated Si(100) surface through subtractive mechanosynthesis using a novel molecule (EAOGe-C2I) and inverted-mode scanning tunneling microscopy (IM-STM), has recently been reported [1]. The design criteria used in the development of this molecule produced a general structural framework for both the abstraction and donation of chemical groups to surfaces based on the reactivity and the competitive bonding of molecular fragments to a reactive surface [2].

This work demonstrates mechanosynthetic donation of C2 from an activated (de-iodinated) EAOGe-C2I molecule to a Si(100) build site . To promote controlled additive mechanosynthetic outcomes, the Si(100) surface was hydrogen-passivated, and bonding sites were selectively activated through dangling bond patterning. This site-specific activation of the build site facilitates the transfer of C2 into the target configuration – an inter-dimer-row bridging geometry of the Si(100)-2x1 surface reconstruction (“IR- C2”) – with high selectivity, marking the first controlled, repeatable example of additive mechanosynthesis and the first report of a carbon dimer in this configuration on silicon.

[1] E. Barrera et al., “Inverted-mode scanning tunneling microscopy for atomically precise fabrication,” arXiv:2512.24431 [cond-mat.mes-hall] (2025), https://doi.org/10.48550/arxiv.2512.24431 (submitted for peer review).

[2] T. Huff et al., “Molecular tools for non-planar surface chemistry,” arXiv:2508.16798 [cond-mat.mtrl-sci] (2025), https://doi.org/10.48550/arXiv.2508.16798 (submitted for peer review).

Keyword-1 Atomically precise fabrication
Keyword-2 STM

Authors

Alex Inayeh Inayeh (CBN Nano Technologies Inc.) Bheeshmon Thanabalasingam (CBN Nano Technologies Inc.) Cameron Mackie (CBN Nano Technologies Inc.) Chris Deimert (CBN Nano Technologies Inc.) Damian Allis (CBN Nano Technologies Inc.) Jonathan Myall (CBN Nano Technologies Inc.) Khalil Sayed-Akhmad (CBN Nano Technologies Inc.) Luis Sandoval Andrade (CBN Nano Technologies Inc.) Megan Cowie (CBN Nano Technologies Inc.) Reid Wotton (CBN Nano Technologies Inc.) Robert Kirby (CBN Nano Technologies Inc.) Ryan Groome (CBN Nano Technologies Inc.) Ryan Yamachika (CBN Nano Technologies Inc.)

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