Speaker
Michael Bradley
Description
Plasma Immersion Ion Implantation (PIII) is a high-fluence ion implantation technique well-suited for implanting large-area and non-planar targets. For these reasons it has found application in semiconductor wafer processing as well as nitridation of alloys and surface treatment of biomedical implants. A newer application of PIII has been using it to study the effects of particle radiation damage on tungsten plasma-facing components (PFCs) intended for plasma fusion applications. In this talk I will review some of our recent experimental work on the subject, including the use of synchrotron-based techniques for damage characterization.
| Keyword-1 | ion implantation |
|---|---|
| Keyword-2 | fusion |
| Keyword-3 | x-ray spectroscopy |
Author
Michael Bradley
Co-author
Dr
Tahreem Yousaf
(Queen's University)