Speaker
Dr
Simon Rushworth
(NMRC)
Description
The FORME strategic research cluster is a Science Foundation of Ireland supported project with 15 funded academic investigators and 5 industry partners. The focus of the work plan is to develop functional oxides and materials for the semiconductor industry however in the later stages of the project applying the results obtained to different industry applications is a key exploitation target.
In particular the deposition of high-k metal oxide thin films for CMOS logic and memory devices along with improved performance MOSFET devices is being investigated. Due to scaling limitations of Si based materials the integration of new materials into standard production technologies is required to ensure Moores Law is complied with in future technology generations. However thin, highly conformal metal oxide films possess a wide number of potential applications outside the semiconductor field ie solar cells, photocatlytic glazing, antimicrobial coatings, biocompatible medical coatings, gas sensors etc.
In this talk the motivation for the project and the different partner objectives will be discussed. In addition some recent results will be presented on Atomic Layer Deposition technology development and examples of its potential in alternative industries provided. The mechanism for Knowledge Transfer to ensure successful roll out of the cluster results will also be described.
Preferred medium (Oral/poster)
Oral
Author
Dr
Simon Rushworth
(NMRC)
